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first_img Analysis: China may have stockpiled 343 immersion deep ultraviolet lithography machines

According to the South China Morning Post, former U.S. officials stated that Chinese semiconductor factories have stockpiled hundreds of immersion lithography machines worth billions of dollars in recent years and urged Washington and its allies to stop further exports. The Centre for Technology & Statecraft, established in August 2026, released a report in late September estimating that by early 2026, Chinese wafer fabs had acquired approximately 343 immersion deep ultraviolet lithography systems. The report was co-authored by former U.S. export control official Nicholas Brown and former White House and Department of Commerce technology policy advisor Saif Khan.The report estimates that about 270 of these are ASML Twinscan NXT:1980i. The authors claim that although these devices lag behind extreme ultraviolet lithography machines, they can be modified for the production of 7-nanometer logic chips and advanced memory required for artificial intelligence processors (including Huawei's Ascend series). Chinese wafer fabs spent over $13 billion in 2024 to purchase about 90 NXT:1980i units, and acquired another 89 units in 2025. ASML disclosed that, by destination, China accounted for 41% of its net system sales in 2024, 33% in 2025, dropping to 19% in the first quarter of 2026 and 14% in the second quarter.Since September 2023, the Netherlands has required export licenses for the NXT:2000i and more advanced immersion deep ultraviolet equipment, effectively banning these models from being shipped to China; a year later, the licensing requirements were extended to the NXT:1980i, but this model can still be approved for shipment on a case-by-case basis.

first_img Kevin Bass: Anthropic builds an unshuttable regulatory capture machine, calling for a congressional investigation

User Kevin Bass posted that he has audited the finances of the artificial intelligence company Anthropic and found shocking circumstances, thus calling for Congress to investigate. Bass stated: Anthropic not only seeks regulatory capture but has also built an unshuttable regulatory capture machine, with structural financial incentives making it impossible to shut down its AI doomsday loop. This loop begins with METR, which Anthropic CEO Dario Amodei proposed to be assessed for model risk by a third-party evaluation agency and suggested METR.Bass claimed that METR financially relies on Anthropic's success, particularly the explosive growth of Anthropic stock exceeding $7 billion. Facebook co-founder Dustin Moskovitz invested this stock into Good Ventures Foundation, which constitutes the majority of the organization's portfolio, and GVF is the overwhelming funder of the entire Anthropic network ecosystem. This stock was worth $500 million earlier last year and is now valued at over $7.7 billion about 16 months later. METR cannot afford to interrupt this growth.Bass pointed out that the same organization funding METR also funds organizations promoting AI doomsday, such as the Tarbell Center, which has published articles in The Verge, Science, Los Angeles Times, and others. These organizations all rely on the same funding. Bass stated that METR and others are not independent of Anthropic and cannot provide independent assessments; Congress must investigate.

first_img TSMC will start mass production using ASML's high NA EUV lithography machines in 2030

On September 8, TSMC announced that starting in 2030, it will adopt a new "high NA" extreme ultraviolet (EUV) lithography machine manufactured by ASML from the Netherlands for mass production. Both parties also stated that they will carry out industry-wide improvements on the high NA machines. ASML monopolizes the supply of EUV lithography machines used to form nanoscale ultra-fine circuits and will begin shipping high NA machines capable of drawing finer circuits starting in December 2023. Intel has already introduced high NA machines, while TSMC previously delayed mass production due to high costs and other reasons.TSMC and ASML will launch an industry-wide project to enlarge the photomask, which serves as the original circuit pattern, from the current 6-inch (approximately 15 centimeters) square to a 12-inch square, and develop high NA machines and related components corresponding to the large masks. A large mask pilot production line is planned to be established before 2031, and the high NA machines corresponding to the large masks are expected to reach a state suitable for advanced semiconductor production before 2033. Major semiconductor manufacturers and mask companies have expressed interest in participating.High NA machines can draw finer circuits, but the area that can be drawn in a single exposure is reduced to half that of traditional models, requiring multiple exposures for large chip circuits, which complicates the process and increases costs. Enlarging the photomask can expand the exposure area and reduce costs. TSMC Chairman and CEO C. C. Wei stated that the company will gather expertise from the entire industry to continuously promote technological innovation that makes advanced technology widely usable and convey its benefits.
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